Configuration | |
Wafer Size | 300mm |
Degrees of freedom (Number of axes) |
4 |
Axes | Z, T, R1, R2 |
End Effectors Types | Vacuum |
Wafer Mapping | N/A |
Physical Properties | |
Minimum robot height (at the lowest Z-axis position) |
400 mm |
Maximum robot height (at the highest Z-axis position) |
2100 mm |
Effective Range of Motion |
Z: 1490 mm T: 290 degrees R1: 449 mm R2: 449 mm |
Performance | |
Max Payload | 1 kg |
Repeatability |
X: 0.1 mm (3σ) Z: 0.1 mm (3σ) T: 0.01° (3σ) R1: 0.1 mm (3σ) R2: 0.1 mm (3σ) |
Environment Cleanliness |
ISO Class 3 Compatible |
Standards Compliance | |
Applicable Directives/Standards |
Machine Directive 89/392/EEC Low Voltage Directive 73/23/EEC 89/336/EEC(EMC) SEMI S2-93A |
Standards to Verify Compliance |
EN 60204-1:1997 EN 55011 EN ISO 12100-2:2003 RIA R15.06:1999 |
Reliability | |
Reliability per SEMI E10 |
MCBF >15M MTBF >100000 h |